UNI37539
UNI37539
Model：UNI37539
Description：
Description：
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High Res Microscopy USAF Targets easily determine the resolution limit of an objective in transmitted light and consists of 59 line patterns with 7.5 to 3300 lp/mm in horizontal and vertical alignment. This target also features 5 pinholes with diameters between 4.0-0.25μm, which allows for detailed characterization of micro-imaging optics.
● Small Pattern Sizes - 100nm and 3300 lp/mm
● Composed using High-Precision E-Beam Lithography
● Negative Pattern Design
